Grosser, Michaela; Münch, M.; Brenner, J.; Wilke, Marcus; Seidel, H.; Bienert, C.; Roosen, A.; Schmid, U.
Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering. - In: Microsystem technologies, ISSN 1432-1858, Bd. 16 (2010), 5, S. 825-836
http://dx.doi.org/10.1007/s00542-009-0993-0
Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering. - In: Microsystem technologies, ISSN 1432-1858, Bd. 16 (2010), 5, S. 825-836
http://dx.doi.org/10.1007/s00542-009-0993-0
Schaaf, Peter; Günschmann, Sabine; Hopfeld, Marcus; Wilden, Johannes; Drescher, Viktor; Borschel, Christian; Ronning, Carsten
Self-organized nanostructuring of composite coatings at high temperatures for drag reduction and self-cleaning. - In: Surface and coatings technology, ISSN 1879-3347, Bd. 205 (2010), 5, S. 1584-1588
https://doi.org/10.1016/j.surfcoat.2010.10.012
Self-organized nanostructuring of composite coatings at high temperatures for drag reduction and self-cleaning. - In: Surface and coatings technology, ISSN 1879-3347, Bd. 205 (2010), 5, S. 1584-1588
https://doi.org/10.1016/j.surfcoat.2010.10.012
Carpene, Ettore; Höche, Daniel; Schaaf, Peter;
Fundamentals of laser-material interactions. - In: Laser processing of materials, (2010), S. 21-44
Fundamentals of laser-material interactions. - In: Laser processing of materials, (2010), S. 21-44
Kups, Thomas;
Crystalline calibration standard for NPM : the use of well known lattice plane distances. - In: Imaging & microscopy, ISSN 1439-4243, Bd. 12 (2010), 2, S. 38-39
Crystalline calibration standard for NPM : the use of well known lattice plane distances. - In: Imaging & microscopy, ISSN 1439-4243, Bd. 12 (2010), 2, S. 38-39
Kosc, Ivan; Hotovy, Ivan; Kompitsas, Michael; Grieseler, Rolf; Wilke, Marcus; Rehacek, Vlastimil; Predanocy, Martin; Kups, Thomas; Spieß, Lothar
The compound oxides based on TiO2 and NiO thin films for low temperature gas detection. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, (2010), S. 337-340
http://dx.doi.org/10.1109/ASDAM.2010.5666355
The compound oxides based on TiO2 and NiO thin films for low temperature gas detection. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, (2010), S. 337-340
http://dx.doi.org/10.1109/ASDAM.2010.5666355
Predanocy, Martin; Fasaki, I.; Wilke, Marcus; Hotovy, Ivan; Kosc, Ivan; Spieß, Lothar
Study of optical and electrical properties of sputtered indium oxide films. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, (2010), S. 297-300
http://dx.doi.org/10.1109/ASDAM.2010.5667003
Study of optical and electrical properties of sputtered indium oxide films. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, (2010), S. 297-300
http://dx.doi.org/10.1109/ASDAM.2010.5667003
Novotný, Ivan; Kotorová, D.; Flickyngerová, Sona; Tvarožek, Vladimir; Spieß, Lothar; Schaaf, Peter; Netrvalová, Marie; Šutta, Pavol
Effect of substrate temperature on oblique-angle sputtered ZnO:Ga thin films. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, (2010), S. 73-76
http://dx.doi.org/10.1109/ASDAM.2010.5666346
Effect of substrate temperature on oblique-angle sputtered ZnO:Ga thin films. - In: 8th International Conference on Advanced Semiconductor Devices & Microsystems (ASDAM), 2010, (2010), S. 73-76
http://dx.doi.org/10.1109/ASDAM.2010.5666346
Wilden, Johannes; Drescher, Viktor E.; Schaaf, Peter; Günschmann, Sabine
Composite coatings with drag reduction and self-cleaning properties. - In: Conference proceedings, (2010), insges. 5 S.
Composite coatings with drag reduction and self-cleaning properties. - In: Conference proceedings, (2010), insges. 5 S.
Amran, Yogev; Katsman, Alexander; Schaaf, Peter; Bamberger, Menachem
Influence of copper addition and temperature on the kinetics of austempering in ductile iron. - In: Metallurgical and materials transactions, ISSN 1543-1916, Bd. 41 (2010), 5, S. 1052-1058
http://dx.doi.org/10.1007/s11663-010-9388-y
Influence of copper addition and temperature on the kinetics of austempering in ductile iron. - In: Metallurgical and materials transactions, ISSN 1543-1916, Bd. 41 (2010), 5, S. 1052-1058
http://dx.doi.org/10.1007/s11663-010-9388-y