New ways to calibrate E2 mass standards and realization of forces up to 10 N :
Neue Wege zur Kalibrierung von E2-Massenormalen und Darstellung von Kräften bis 10 N. - In: Technisches Messen, ISSN 2196-7113, Bd. 87 (2020), 4, S. 280-293
https://doi.org/10.1515/teme-2019-0143
Tip- and laser-based nanofabrication up to 100 mm with sub-nanometre precision. - In: Novel Patterning Technologies for Semiconductors, MEMS/NEMS and MOEMS 2020, (2020), S. 113240A-1-113240A-17
Although the field of optical lithography is highly investigated and numerous improvements are made, structure sizes smaller than 20 nm can only be achieved by considerable effort when using conventional technology. To cover the upcoming tasks in future lithography, enormous exertion is put into the development of alternative fabrication technologies in particular for micro- and nanotechnologies that are capable of measuring and patterning at the atomic scale in growing operating areas of several hundred square millimetres. Many new technologies resulted in this process, and are promising to overcome the current limitations^1, 2, but most of them are demonstrated in small areas of several square micrometers only, using state-of-the-art piezo stages or the like. At the Technische Universitat Ilmenau, the NanoFabrication Machine 100 (NFM-100) was developed, which serves as an important experimental platform for basic research in the field of scale-spanning AFM tip-based and laser-based nanomeasuring and nanofabrication for simultaneous subnanometre measuring and structuring on surfaces up to Ø100 mm. This machine can be equipped with several probing systems like AFM, laser focus probes and 3D-micro probes as well as tools for different nanofabrication technologies like tip-based technologies, optical technologies and mechanical two-dimensional technologies in a large working range with subnanometre reproducibility and uncertainty. In this paper, the specifics and advantages of the NFM-100 will be described as well as nanofabrication technologies that are currently worked on e.g. advanced scanning proximal probe lithography based on Fowler-Nordheim-electron-field emission, direct laser writing and UV-nanoimprint lithography.
https://doi.org/10.1117/12.2551044
Cryogenic etching for pattern transfer into silicon of Mix-and-Match structured resist layers. - In: Microelectronic engineering, Bd. 227 (2020), 111325, insges. 5 S.
A Mix-and-Match lithography method for a high-resolution, high-precision and cost effective lithography tool using DLW and FE-SPL was developed and successfully realized. The pattern transfer from the photoresist to the silicon substrate is done by so-called "cryogenic etching". It means that the substrate is cooled down to cryogenic temperatures. In contrast to etching processes at standard room temperature, the cryogenic temperatures (below -100 ˚C) enable a highly anisotropic etching process. The difference between etching at room temperature compared to cryogenic etching is carried out in this work. The advantages of the etching process are highlighted for the pattern transfer from Mix-and-Match-structured samples. Therefore, the used photoresist mr-P 1201LIL (microresist technologies GmbH) has been examined concerning its silicon-to-resist selectivity which could be determined to be 6:1 for the applied etching recipe. Using cryogenic etching, we are now able to transfer the Mix-and-Match-structured patterns into silicon with appreciable high selectivities. This opens a novel pathway for the manufacturing of quantum devices on large wafers. The paper discusses current research results based on the TU Ilmenau Nanopositioning and Nanomeasuring Machines (NPMM) including the novel application of nanofabrication. First, the basic setup and the resulting benefits of the NPMMs for measuring and fabrication in a working volume of up to 200 mm × 200 mm × 25 mm while abiding nanometer accuracy is described. This is in contradiction to state-of-the-art AFM scanners, which have a limited working range of appr. 100 [my]m × 100 [my]m. Next, the principle and the results of different nanofabrication technologies are shown. These include Scanning Probe Lithography (SPL), Direct Laser Writing (DLW) and UV-nanoimprint lithography (NIL). Last, efforts for further improving the feature placement accuracy of the NPMMs as well as attempts to combine several fabrication technologies to improve their throughput are touched on.
https://doi.org/10.1016/j.mee.2020.111325
Challenges of temperature measurement during the friction stir welding process. - In: Measuring Equipment and Metrology, ISSN 2617-846X, Bd. 81 (2020), 1, insges. 8 S.
The exact determination of the process zone temperature can be considered as an increasingly important role in the control and monitoring of the friction stir welding process (FSW). At present, temperature measurement is carried out with the aid of a temperature sensor integrated into the tool (usually thermocouples). Since these cannot be attached directly to the joining area, heat dissipation within the tool and to the environment cause measurement deviations as well as a time delay in the temperature measurement. The article describes a process and the challenges that arise in this process, how a direct temperature measurement during the process can be achieved by exploiting the thermoelectric effect between tool and workpiece, without changing the tool by introducing additional temperature sensors.
https://doi.org/10.23939/istcmtm2020.01.034
Crystallinity, thermal diffusivity, and electrical conductivity of carbon black filled polyamide 46. - In: Journal of applied polymer science, ISSN 1097-4628, Bd. 137 (2020), 29, 48882, S. 1-10
https://doi.org/10.1002/app.48882
Linear displacement calibration system integrated with a novel auto-alignment module for optical axes. - In: Sensors, ISSN 1424-8220, Bd. 20 (2020), 9, 2462, insges. 13 S.
https://doi.org/10.3390/s20092462
Comparison of different methods for experimental determining the inhomogeneity of thermocouples :
Vergleich verschiedener Methoden zur experimentellen Bestimmung der Inhomogenität von Thermoelementen. - In: Technisches Messen, ISSN 2196-7113, Bd. 87 (2020), 3, S. 146-152
https://doi.org/10.1515/teme-2019-0138
Determination of the mixing ratio of a flowing gas mixture with self-actuated microcantilevers. - In: Journal of sensors and sensor systems, ISSN 2194-878X, Bd. 9 (2020), 1, S. 71-78
https://doi.org/10.5194/jsss-9-71-2020
Mix-and-match lithography and cryogenic etching for NIL template fabrication. - In: Microelectronic engineering, Bd. 224 (2020), 111234
https://doi.org/10.1016/j.mee.2020.111234
Nanopositioning and nanomeasuring machines. - In: Metrology, (2019), S. 35-58
Continuing engineering progress in precision fabrication technologies, especially in the semiconductor industry, precision optics fabrication, and the diversified micro- and nanotechnologies, stimulates the advance in precision metrology. Fabricated structures reach atomic dimensions in ever-larger areas, thus becoming more and more complex, also in three dimensions. Consequently, measurements are made - to an increasing extent - of larger surface regions and sidewalls with higher aspect ratios as well as fully 3D micro- and nanostructures. Advanced high precision measurement technology is more and more an enabling technology for nanotechnologies. Today, nanopositioning and nanomeasuring machines provide high-precision measurements and the positioning of objects across different scales, from subnanometers up to several centimeters. This chapter deals with the requirements for highest measurement performance at the limits of physics and technology, resulting from the progress and the goals of modern high-tech fabrication technologies. The fundamentals of the nanopositioning and nanomeasuring machine, developed at the Institute of Process Measurement and Sensor Technology of the Ilmenau University of Technology and manufactured by the SIOS Meßtechnik GmbH Ilmenau, are described, and the measurement capabilities, potential applications, progress in research, and prospects of the device for the near future are pointed out.