High precission optical position sensor for electromagnetic force compensated balances. - In: IMEKO TC3 & TC5 & TC22 International Conference, (2010), S. 91-94
Vacuum transfer system for loading the Sartorius prototype mass comparator CCL1007. - In: IMEKO TC3 & TC5 & TC22 International Conference, (2010), S. 77-80
Comparison of different load changers for EMFC-balances. - In: IMEKO TC3 & TC5 & TC22 International Conference, (2010), S. 65-68
Parametric mechatronic model of a load cell with electromagnetic force compensation. - In: IMEKO TC3 & TC5 & TC22 International Conference, (2010), S. 29-32
Determining magnetic properties of mass standards by using the susceptometer method :
Bestimmung magnetischer Eigenschaften von Massenormalen mit der Suszeptometermethode. - In: Sensoren und Messsysteme 2010, (2010), S. 645-649
Metrology and measurement uncertainty of nanopositioning- and nanomeasuring machines :
Metrologie und Messunsicherheit von Nanopositionier- und Nanomessmaschinen. - In: Sensoren und Messsysteme 2010, (2010), S. 474-477
Development of nanomeasuring and nanopositioning machines. - In: Sensoren und Messsysteme 2010, (2010), S. 19-23
Three-dimensional nanopositioning and nanomeasuring machine with a resolution of 0.1 nm. - In: Optoelectronics, instrumentation and data processing, ISSN 1934-7944, Bd. 46 (2010), 4, S. 318-323
The paper describes traceable nanometrology based on a nanopositoning machine with integrated nanoprobes. The operation of a high-precision long-range three-dimensional nanopositioning and nanomeasuring machine (NMM-1) having a resolution of 0.1 nm over the positioning and measuring range of 25 x 25 x 5 mm is explained. Various developed probe systems have been integrated into the NMM-1 machine, including a focus sensor, a white light sensor, and tactile nanoprobes. Single-beam, double-beam and triple-beam interferometers are installed into the NMM-1 machine to measure and control the six degrees of freedom. Measured results are presented.
http://dx.doi.org/10.3103/S8756699010040035
Nanomeasuring and nanopositioning engineering. - In: Measurement, Bd. 43 (2010), 9, S. 1099-1105
The paper describes traceable nanometrology based on a nanopositioning machine with integrated nanoprobes. The operation of a high-precision long range three-dimensional nanopositioning and nanomeasuring machine (NPM-Machine) having a resolution of 0,1 nm over the positioning and measuring range of 25 mm x 25 mm x 5 mm is explained. An Abbe offset-free design of three miniature plan mirror interferometers and applying a new concept for compensating systematic errors resulting from mechanical guide systems provide very small uncertainties of measurement. The NPM-Machine has been developed by the Institute of Process Measurement and Sensor Technology of the Technische Universität Ilmenau and manufactured by the SIOS Messtechnik GmbH Ilmenau. The machines are operating successfully in several German and foreign research institutes including the Physikalisch-Technische Bundesanstalt (PTB), Germany. The integration of several, optical and tactile probe systems and nanotools makes the NPM-Machine suitable for various tasks, such as large-area scanning probe microscopy, mask and wafer inspection, nanostructuring, biotechnology and genetic engineering as well as measuring mechanical precision workpieces, precision treatment and for engineering new material. Various developed probe systems have been integrated into the NPM-Machine. The measurement results of a focus sensor, metrological AFM, white light sensor and tactile stylus probes are presented. Single beam-, double beam- and triple beam interferometers built in the NPM-Machine for six degrees of freedom measurements are described.
http://dx.doi.org/10.1016/j.measurement.2010.04.008
Herausforderungen und Grenzen der interferometrischen Präzisionsmesstechnik. - In: Jahrbuch Optik und Feinmechanik, ISSN 0075-272X, Bd. 56 (2010), S. 1-8