Yanev, Vasil;
Schwesinger, Norbert; Wurmus, Helmut
Chemical resistance of thin plasma polymerized fluorocarbon films in inorganic etching solutions used in microstructure technology. - In: Micro system technologies 2001, (2001), S. 523-525
Chemical resistance of thin plasma polymerized fluorocarbon films in inorganic etching solutions used in microstructure technology. - In: Micro system technologies 2001, (2001), S. 523-525
Koitzsch, Christian; Conrad, D.; Scheerschmidt, K.; Scharmann, Friedhelm; Maslarski, P.; Pezoldt, Jörg
Carbon-induced reconstructions on Si(111) investigated by RHEED and molecular dynamics. - In: Applied surface science, Bd. 179 (2001), 1/4, S. 49-54
http://dx.doi.org/10.1016/S0169-4332(01)00262-8
Carbon-induced reconstructions on Si(111) investigated by RHEED and molecular dynamics. - In: Applied surface science, Bd. 179 (2001), 1/4, S. 49-54
http://dx.doi.org/10.1016/S0169-4332(01)00262-8
Rybin, Peter V.; Kulikov, Dmitri V.; Trushin, Yuri V.; Yankov, Rossen A.; Voelskow, Matthias; Scharmann, Friedhelm; Pezoldt, Jörg
Theoretical and experimental investigations of defect evolution in silicon carbide during N+ and Al+ ion implantation taking into account internal stress fields. - In: Nuclear instruments & methods in physics research. Beam interactions with materials and atoms. - Amsterdam [u.a.] : Elsevier, 1984- , ZDB-ID: 1466524-4, Bd. 178 (2001), 1/4, S. 269-274
http://dx.doi.org/10.1016/S0168-583X(00)00476-6
Theoretical and experimental investigations of defect evolution in silicon carbide during N+ and Al+ ion implantation taking into account internal stress fields. - In: Nuclear instruments & methods in physics research. Beam interactions with materials and atoms. - Amsterdam [u.a.] : Elsevier, 1984- , ZDB-ID: 1466524-4, Bd. 178 (2001), 1/4, S. 269-274
http://dx.doi.org/10.1016/S0168-583X(00)00476-6
Ehrhardt, Waleed; Thust, Heiko
Trimming of buried RuO2 - based thick-film-resistors in multilayer ceramics technology (LTCC) by energy of high voltage pulses. - In: Proceedings, the 38th IMAPS Nordic annual conference, (2001), S. 316-321
Trimming of buried RuO2 - based thick-film-resistors in multilayer ceramics technology (LTCC) by energy of high voltage pulses. - In: Proceedings, the 38th IMAPS Nordic annual conference, (2001), S. 316-321
Mikroulis, S.; Cimalla, Volker; Kostopoulos, A.; Constandinidis, G.; Drakakis, G.; Zervos, M.; Cengher, M.; Georgakilas, A.
Investigation of the nitridation of Al2O3 (0001) substrates by a nitrogen radio frequency plasma source. - In: Microelectronics, microsystems and nanotechnology, (2001), S. 135-138
Investigation of the nitridation of Al2O3 (0001) substrates by a nitrogen radio frequency plasma source. - In: Microelectronics, microsystems and nanotechnology, (2001), S. 135-138
Hülsenberg, Dagmar; Mache, Thomas; Fehling, Peer; Marx, Günter
Rasterkraftmikroskopische Charakterisierung von Faserbeschichtungen. - In: Kurzreferateband, (2001), S. 91, insges. 2 S.
Rasterkraftmikroskopische Charakterisierung von Faserbeschichtungen. - In: Kurzreferateband, (2001), S. 91, insges. 2 S.
Harnisch, Alf; Hülsenberg, Dagmar; Hecht-Mijic, Stephan; Mrotzek, Susanne; Brokmann, Ulrike
UV-microstructurable glasses - an overview. - In: Extended abstracts, (2001), S. 303-304
UV-microstructurable glasses - an overview. - In: Extended abstracts, (2001), S. 303-304
Ivanic, R.; Rehacek, Vlastimil; Novotny, I.; Breternitz, Volkmar; Spieß, Lothar; Knedlik, Christian; Tvarotzek, V.
Sputtered yttrium oxide thin films appropriate for electrochemical sensors. - In: Vacuum, ISSN 0042-207X, Bd. 61 (2001), 2/4, S. 229-234
http://dx.doi.org/10.1016/S0042-207X(01)00117-8
Sputtered yttrium oxide thin films appropriate for electrochemical sensors. - In: Vacuum, ISSN 0042-207X, Bd. 61 (2001), 2/4, S. 229-234
http://dx.doi.org/10.1016/S0042-207X(01)00117-8
Pezoldt, Jörg; Schröter, B.; Cimalla, Volker; Stauden, Thomas; Goldhahn, Rüdiger; Romanus, Henry; Spieß, Lothar
Carbonization induced change of the polarity for MBE grown 3C-SiC/Si(111). - In: Silicon carbide and related materials, (2001), S. 179-182
Carbonization induced change of the polarity for MBE grown 3C-SiC/Si(111). - In: Silicon carbide and related materials, (2001), S. 179-182
Kallenbach, Eberhard; Wurmus, Helmut
Mechatronik - eine neue Generation der Mikro- und Feinwerktechnik. - In: Deutsche IMAPS Konferenz, (2001), S. 32-54
Mechatronik - eine neue Generation der Mikro- und Feinwerktechnik. - In: Deutsche IMAPS Konferenz, (2001), S. 32-54