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Resistance and dopant profiling along freestanding GaAs nanowires. - In: Applied physics letters, ISSN 1077-3118, Bd. 103 (2013), 14, S. 143104, insges. 4 S.
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Plasma- und Galvanotechnik - zwei Seiten einer Medaille?. - In: Jahrbuch Oberflächentechnik, ISSN 0075-2819, Bd. 69 (2013), S. 49-60
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Domain-sensitive in situ observation of layer-by-layer removal at Si(100) in H 2 ambient. - In: New journal of physics, ISSN 1367-2630, Bd. 15 (2013), 113049, insges. 10 S.
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Epitaxial III-V thin film absorbers: preparation, efficient InP photocathodes and routes to high efficiency tandem structures. - In: Photoelectrochemical water splitting, (2013), S. 223-265
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Wie und wo studiert man Nano?. - In: Nanotechnologie aktuell, ISSN 1866-4997, Bd. 6 (2013), S. 126-128
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Microstructure and particle incorporation behavior of electrocodeposited Ni-Al2O3 nanocomposites. - In: Journal for electrochemistry and plating technology, ISSN 2196-0267, (2013), S. 1-16
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Microstructure and particle incorporation behavior of electrocodeposited Ni-Al2O3 nanocomposites. - In: Journal for electrochemistry and plating technology, ISSN 2196-0267, (2013), S. 1-16
Im Titel sind "2" und "3" tiefgestellt
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