Schaaf, Peter; Günschmann, Sabine; Hopfeld, Marcus; Wilden, Johannes; Drescher, Viktor; Borschel, Christian; Ronning, Carsten
Self-organized nanostructuring of composite coatings at high temperatures for drag reduction and self-cleaning. - In: Surface and coatings technology, ISSN 1879-3347, Bd. 205 (2010), 5, S. 1584-1588
https://doi.org/10.1016/j.surfcoat.2010.10.012
Self-organized nanostructuring of composite coatings at high temperatures for drag reduction and self-cleaning. - In: Surface and coatings technology, ISSN 1879-3347, Bd. 205 (2010), 5, S. 1584-1588
https://doi.org/10.1016/j.surfcoat.2010.10.012
Carpene, Ettore; Höche, Daniel; Schaaf, Peter
Fundamentals of laser-material interactions. - In: Laser processing of materials, (2010), S. 21-44
Fundamentals of laser-material interactions. - In: Laser processing of materials, (2010), S. 21-44
Kups, Thomas;
Crystalline calibration standard for NPM : the use of well known lattice plane distances. - In: Imaging & microscopy, ISSN 1439-4243, Bd. 12 (2010), 2, S. 38-39
Crystalline calibration standard for NPM : the use of well known lattice plane distances. - In: Imaging & microscopy, ISSN 1439-4243, Bd. 12 (2010), 2, S. 38-39
Amran, Yogev; Katsman, Alexander; Schaaf, Peter; Bamberger, Menachem
Influence of copper addition and temperature on the kinetics of austempering in ductile iron. - In: Metallurgical and materials transactions. Process metallurgy and materials processing science. - New York, NY : Springer Sciences & Business Media, 1975- , ISSN: 1543-1916 , ZDB-ID: 2037524-4, ISSN 1543-1916, Bd. 41 (2010), 5, S. 1052-1058
http://dx.doi.org/10.1007/s11663-010-9388-y
Influence of copper addition and temperature on the kinetics of austempering in ductile iron. - In: Metallurgical and materials transactions. Process metallurgy and materials processing science. - New York, NY : Springer Sciences & Business Media, 1975- , ISSN: 1543-1916 , ZDB-ID: 2037524-4, ISSN 1543-1916, Bd. 41 (2010), 5, S. 1052-1058
http://dx.doi.org/10.1007/s11663-010-9388-y
Petrova, Maria; Noncheva, Zoja; Jakob, Christine; Mache, Thomas
Chemische Abscheidung von Nickel-Phosphor-Dispersionsschichten hoher Schichtdicke. - In: Galvanotechnik, ISSN 0016-4232, Bd. 101 (2010), 7, S. 1498-1502
Chemische Abscheidung von Nickel-Phosphor-Dispersionsschichten hoher Schichtdicke. - In: Galvanotechnik, ISSN 0016-4232, Bd. 101 (2010), 7, S. 1498-1502
Petrova, Maria; Noncheva, Zoja; Jakob, Christine; Mache, Thomas
Chemische Abscheidung von Nickel-Phosphor-Dispersionsschichten hoher Schichtdicke. - In: Produktion von Leiterplatten und Systemen, ISSN 1436-7505, Bd. 12 (2010), 8, S. 1764-1768
Chemische Abscheidung von Nickel-Phosphor-Dispersionsschichten hoher Schichtdicke. - In: Produktion von Leiterplatten und Systemen, ISSN 1436-7505, Bd. 12 (2010), 8, S. 1764-1768
Hopfeld, Marcus; Wilden, Johannes; Drescher, Viktor E.; Schaaf, Peter
In-situ synthesis of Y2W3O12 within a Co-based superalloy powder mixture. - In: International journal of materials research, ISSN 2195-8556, Bd. 101 (2010), 8, S. 1042-1045
Im Titel sind "2", "3" und "12" tiefgestellt
https://doi.org/10.3139/146.110374
In-situ synthesis of Y2W3O12 within a Co-based superalloy powder mixture. - In: International journal of materials research, ISSN 2195-8556, Bd. 101 (2010), 8, S. 1042-1045
Im Titel sind "2", "3" und "12" tiefgestellt
https://doi.org/10.3139/146.110374
Ispas, Adriana; Adolphi, Barbara; Bund, Andreas; Endres, Frank
On the electrodeposition of tantalum from three different ionic liquids with the bis(trifluoromethyl sulfonyl) amide anion. - In: Physical chemistry, chemical physics, ISSN 1463-9084, Bd. 12 (2010), 8, S. 1793-1803
http://dx.doi.org/10.1039/B922071M
On the electrodeposition of tantalum from three different ionic liquids with the bis(trifluoromethyl sulfonyl) amide anion. - In: Physical chemistry, chemical physics, ISSN 1463-9084, Bd. 12 (2010), 8, S. 1793-1803
http://dx.doi.org/10.1039/B922071M
Bartsch, Heike; Rensch, Christian; Fischer, Michael; Schober, Andreas; Hoffmann, Martin; Müller, Jens
Thick film flow sensor for biological microsystems. - In: Sensors and actuators, ISSN 1873-3069, Bd. 160 (2010), 1/2, S. 109-115
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Thick film flow sensor for biological microsystems. - In: Sensors and actuators, ISSN 1873-3069, Bd. 160 (2010), 1/2, S. 109-115
http://dx.doi.org/10.1016/j.sna.2010.04.010