Realizing super-long Cu2O nanowires arrays for high-efficient water splitting applications with a convenient approach. - In: Journal of semiconductors, ISSN 2058-6140, Bd. 40 (2019), 5, 052701, S. 1-6
https://doi.org/10.1088/1674-4926/40/5/052701
Two-photon photoemission spectroscopy for studying energetics and electron dynamics at semiconductor interfaces. - In: Physica status solidi, ISSN 1862-6319, Bd. 216 (2019), 8, S. 1800738, insges. 10 S.
https://doi.org/10.1002/pssa.201800738
Trivalent chromium conversion coatings. - In: Journal of coatings technology and research, ISSN 1935-3804, Bd. 16 (2019), 3, S. 623-641
https://doi.org/10.1007/s11998-019-00210-9
In situ production of titanium aluminides during wire arc additive manufacturing with hot-wire assisted GMAW process. - In: Metals, ISSN 2075-4701, Bd. 9 (2019), 5, 578, insges. 13 S.
https://doi.org/10.3390/met9050578
Temperature dependence of dynamic parameters of contact thermometers. - In: Sensors, ISSN 1424-8220, Bd. 19 (2019), 10, 2299, insges. 9 S.
https://doi.org/10.3390/s19102299
Fabrication of 3D microchannels for tissue engineering in photosensitive glass using NIR femtosecond laser radiation. - In: Biomedical glasses, ISSN 2299-3932, Bd. 5 (2019), 1, S. 34-45
https://doi.org/10.1515/bglass-2019-0003
Tip-based nano-manufacturing and -metrology. - In: Journal of vacuum science & technology, ISSN 2166-2754, Bd. 37 (2019), 3, S. 030803, insges. 9 S.
Sub-5 nm lithography and metrology are the key technologies for more CMOS and beyond CMOS nanoelectronics. To keep up with scaling down of nanoelectronic components, novel instrumentation for nanometer precise placement, overlay alignment, and measurement are essential to enable fabrication of next generation nanoelectronic systems. In particular, scanning probe microscopy (SPM) based methods for surface modification and measurement are the emerging techniques for producing and testing of sub-5 nm features. In this article, the authors demonstrate nanoscale lithography and coordinate metrology technologies, both being based on SPM methodology. Scanning probes with a piezoresistive deflection read-out and an integrated deflection actuator, later on referred to as the active piezoresistive cantilevers, were used for lithography employing field emission patterning. They were also integrated with the so-called nanomeasuring machine (NPM) andused for surface imaging, which made it possible to measure the structure dimensions in the 25 × 25 × 5 mm^3 space with 0.1 nm resolution and great accuracy. The basic NPM concept relies on a unique arrangement, enabling the so-called Abbe error-free measurements in all axes over the total scan range. The combination of the active piezoresistive cantilevers and NPM technologies makes it possible to store the exact location on the investigated surface, which can be found again with an accuracy of less than 2.5 nm. This system is also predestinated for the critical dimension, quality, and overlay control.
https://doi.org/10.1116/1.5083044
Electrochemical characteristics of cobaltosic oxide in organic electrolyte according to bode plots: double-layer capacitance and pseudocapacitance. - In: ChemElectroChem, ISSN 2196-0216, Bd. 6 (2019), 9, S. 2456-2463
https://doi.org/10.1002/celc.201900289
Advances on three-dimensional electrodes for micro-supercapacitors: a mini-review. - In: InfoMat, ISSN 2567-3165, Bd. 1 (2019), 1, S. 74-84
https://doi.org/10.1002/inf2.12007
C60 fullerenes selectively inhibit BKCa but not Kv channels in pulmonary artery smooth muscle cells. - In: Nanomedicine, ISSN 1549-9642, Bd. 19 (2019), S. 1-11
Im Titel sind "60", "Ca" und "v" tiefgestellt
https://doi.org/10.1016/j.nano.2019.03.018