Structural and local electronic properties of clean and Li-intercalated graphene on SiC(0001). - In: Surface science, ISSN 1879-2758, Bd. 699 (2020), 121638
https://doi.org/10.1016/j.susc.2020.121638
Experimental and theoretical study of electronic and hyperfine properties of hydrogenated anatase (TiO2): defect interplay and thermal stability. - In: The journal of physical chemistry, ISSN 1932-7455, Bd. 124 (2020), 13, S. 7511-7522
Im Titel ist "2" tiefgestellt
https://doi.org/10.1021/acs.jpcc.0c00085
Optofluidic liquid sensing on electromicrofluidic devices. - In: Materials Research Express, ISSN 2053-1591, Volume 7 (2020), number 3, 036407, 7 Seiten
https://doi.org/10.1088/2053-1591/ab7fdf
Formation of ordered anodic alumina nanofibers during aluminum anodizing in oxalic acid at high voltage and electrical power. - In: Surface and coatings technology, ISSN 1879-3347, Bd. 394 (2020), 125813
https://doi.org/10.1016/j.surfcoat.2020.125813
eMIL: advanced emission Mössbauer spectrometer for measurements in versatile conditions. - In: Nuclear instruments & methods in physics research, ISSN 0168-9002, Bd. 968 (2020), 163973, S. 1-6
https://doi.org/10.1016/j.nima.2020.163973
Nonlinear plasmon-exciton coupling enhances sum-frequency generation from a hybrid metal/semiconductor nanostructure. - In: Nature Communications, ISSN 2041-1723, Bd. 11 (2020), 1464, S. 1-10
https://doi.org/10.1038/s41467-020-15232-w
Practical challenges in the development of photoelectrochemical solar fuels production. - In: Sustainable energy & fuels, ISSN 2398-4902, Bd. 4 (2020), 3, S. 985-995
https://doi.org/10.1039/C9SE00869A
Cryogenic etching for pattern transfer into silicon of Mix-and-Match structured resist layers. - In: Microelectronic engineering, Bd. 227 (2020), 111325, insges. 5 S.
A Mix-and-Match lithography method for a high-resolution, high-precision and cost effective lithography tool using DLW and FE-SPL was developed and successfully realized. The pattern transfer from the photoresist to the silicon substrate is done by so-called "cryogenic etching". It means that the substrate is cooled down to cryogenic temperatures. In contrast to etching processes at standard room temperature, the cryogenic temperatures (below -100 ˚C) enable a highly anisotropic etching process. The difference between etching at room temperature compared to cryogenic etching is carried out in this work. The advantages of the etching process are highlighted for the pattern transfer from Mix-and-Match-structured samples. Therefore, the used photoresist mr-P 1201LIL (microresist technologies GmbH) has been examined concerning its silicon-to-resist selectivity which could be determined to be 6:1 for the applied etching recipe. Using cryogenic etching, we are now able to transfer the Mix-and-Match-structured patterns into silicon with appreciable high selectivities. This opens a novel pathway for the manufacturing of quantum devices on large wafers. The paper discusses current research results based on the TU Ilmenau Nanopositioning and Nanomeasuring Machines (NPMM) including the novel application of nanofabrication. First, the basic setup and the resulting benefits of the NPMMs for measuring and fabrication in a working volume of up to 200 mm × 200 mm × 25 mm while abiding nanometer accuracy is described. This is in contradiction to state-of-the-art AFM scanners, which have a limited working range of appr. 100 [my]m × 100 [my]m. Next, the principle and the results of different nanofabrication technologies are shown. These include Scanning Probe Lithography (SPL), Direct Laser Writing (DLW) and UV-nanoimprint lithography (NIL). Last, efforts for further improving the feature placement accuracy of the NPMMs as well as attempts to combine several fabrication technologies to improve their throughput are touched on.
https://doi.org/10.1016/j.mee.2020.111325
Effect of polyalcohols on the anticorrosive behaviour of alkyd coatings prepared with drying oils. - In: Progress in organic coatings, Bd. 145 (2020), 105671
https://doi.org/10.1016/j.porgcoat.2020.105671
Numerical analysis of temperature distribution during laser deep welding of duplex stainless steel using a two-beam method. - In: Welding in the world, ISSN 1878-6669, Bd. 64 (2020), 5, S. 623-632
https://doi.org/10.1007/s40194-020-00857-8