Gesamtliste der Publikationen

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Erstellt: Wed, 17 Jul 2024 23:05:38 +0200 in 0.0544 sec


Bartz, Frederik; Gehrmann, Stephan; Augustin, Silke; Ackermann, Vincent; Fröhlich, Thomas
Measurement and calculation of surface temperature on tyre samples. - In: SMSI 2021, (2021), S. 195-196

https://doi.org/10.5162/SMSI2021/C3.4
Dannberg, Oliver; Cherkasova, Valeriya; Fröhlich, Thomas
A control concept of a compensation load cell in terms of calibration a cantilever. - In: SMSI 2021, (2021), S. 59-60

https://doi.org/10.5162/SMSI2021/A3.4
Dannberg, Oliver; Kühnel, Michael; Fröhlich, Thomas
Development of a traceable cantilever calibration device. - In: SMSI 2021, (2021), S. 57-58

https://doi.org/10.5162/SMSI2021/A3.3
Pabst, Markus; Darnieder, Maximilian; Theska, René; Fröhlich, Thomas
Adjustment concept for compensating stiffness and tilt sensitivity of a novel monolithic EMFC weighing cell. - In: SMSI 2021, (2021), S. 53-54

This paper describes the experimental investigation of a new adjustment concept for planar monolithic high precision electromagnetic force compensated weighing cells. The concept allows to adjust the stiffness and the tilt sensitivity of the compliant mechanisms to an optimum. A new prototype mechanism is set up and adjusted according to the developed mechanical model. For evaluation of the concept, the system was tested on a high precision tilt table and under high vacuum conditions.



https://doi.org/10.5162/SMSI2021/A3.1
Manske, Eberhard; Theska, René; Fröhlich, Thomas; Ortlepp, Ingo
Foreword to the special issue on "Tip- and laser-based 3D nanofabrication in extended macroscopic working areas". - In: Nanomanufacturing and metrology, ISSN 2520-8128, Bd. 4 (2021), 3, S. 131

https://doi.org/10.1007/s41871-021-00113-7
Shin, Dong Wook; Quan, Lue; Shimizu, Yuki; Matsukuma, Hiraku; Cai, Yindi; Manske, Eberhard; Gao, Wei
In-situ evaluation of the pitch of a reflective-type scale grating by using a mode-locked femtosecond laser. - In: Applied Sciences, ISSN 2076-3417, Bd. 11 (2021), 17, 8028, S. 1-16

Major modifications are made to the setup and signal processing of the method of in-situ measurement of the pitch of a diffraction grating based on the angles of diffraction of the diffracted optical frequency comb laser emanated from the grating. In the method, the improvement of the uncertainty of in-situ pitch measurement can be expected since every mode in the diffracted optical frequency comb laser can be utilized. Instead of employing a Fabry-Pérot etalon for the separation of the neighboring modes in the group of the diffracted laser beams, the weight-of-mass method is introduced in the method to detect the light wavelength in the Littrow configuration. An attempt is also made to reduce the influence of the non-uniform spectrum of the optical comb laser employed in the setup through normalization operation. In addition, an optical alignment technique with the employment of a retroreflector is introduced for the precise alignment of optical components in the setup. Furthermore, a mathematical model of the pitch measurement by the proposed method is established, and theoretical analysis on the uncertainty of pitch measurement is carried out based on the guide to the expression of uncertainty in measurement (GUM).



https://doi.org/10.3390/app11178028
Tobehn-Steinhäuser, Ingo; Reiche, Manfred; Schmelz, Matthias; Stolz, Ronny; Fröhlich, Thomas; Ortlepp, Thomas
Carrier mobility in semiconductors at very low temperatures. - In: Engineering proceedings, ISSN 2673-4591, Bd. 6 (2021), 1, 86, insges. 5 S.

Carrier mobilities and concentrations were measured for different p- and n-type silicon materials in the temperature range 0.3-300 K. Simulations show that experimentally determined carrier mobilities are best described in this temperature range by Klaassen's model. Freeze-out reduces the carrier concentration with decreasing temperature. Freeze-out, however, depends on the dopant type and initial concentration. Semi-classical calculations are useful only for temperatures above 100 K. Otherwise quantum mechanical calculations are required.



https://doi.org/10.3390/I3S2021Dresden-10086
Ortlepp, Ingo; Stauffenberg, Jaqueline; Manske, Eberhard
Processing and analysis of long-range scans with an atomic force microscope (AFM) in combination with nanopositioning and nanomeasuring technology for defect detection and quality control. - In: Sensors, ISSN 1424-8220, Bd. 21 (2021), 17, 5862, insges. 17 S.

This paper deals with a planar nanopositioning and -measuring machine, the so-called nanofabrication machine (NFM-100), in combination with a mounted atomic force microscope (AFM). This planar machine has a circular moving range of 100 mm. Due to the possibility of detecting structures in the nanometre range with an atomic force microscope and the large range of motion of the NFM-100, structures can be analysed with high resolution and precision over large areas by combining the two systems, which was not possible before. On the basis of a grating sample, line scans over lengths in the millimetre range are demonstrated on the one hand; on the other hand, the accuracy as well as various evaluation methods are discussed and analysed.



https://doi.org/10.3390/s21175862
Belkner, Johannes; Ortlepp, Ingo; Gerhardt, Uwe; Manske, Eberhard
Compensating aberration induced error in differential confocal microscopy. - In: Optical Measurement Systems for Industrial Inspection XII, (2021), S. 117820P-1-117820P-10

Confocal microscopy is a working horse of optical profilometry since decades. It is a pointwise measurement method, where the whole sample must be scanned in all three dimensions. The high lateral resolution thereby outstrips its lowered scanning speed compared to widefield based principles. Furthermore, for a single 3D surface, even single-digit nanometre depth-resolution has been shown. However, albeit such high axial resolution, the accuracy may suffer from sample or optics induced wavefront distortions that differ from point to point. The acquired signal then experiences a shift that leads to a wrong acquired depth. Here we model this error through a low NA scalar model. We further present a method to compensate this error significantly by enhancing the principle of differential confocal microscopy. Theoretical results show the possibility for ideal compensation of the error caused by such in-stationary aberrations in confocal depth measurements.



https://doi.org/10.1117/12.2592392