Weinberger, Stefan; Jakovlev, Oleg; Winkelmann, Cord-Hinrich; Markweg, Eric; Polster, Tobias; Hoffmann, Martin
Development of a novel micromirror with high static rotation angle for measurement applications. - In: Abstracts, ISBN 978-90-816737-1-6, (2010), S. 289-292
http://eprints.eemcs.utwente.nl/19346/
Development of a novel micromirror with high static rotation angle for measurement applications. - In: Abstracts, ISBN 978-90-816737-1-6, (2010), S. 289-292
http://eprints.eemcs.utwente.nl/19346/
As, Donat J.; Tschumak, Elena; Niebelschütz, Florentina; Jatal, Wael; Petzoldt, Joerg; Granzner, Ralf; Schwierz, Frank; Lischka, Klaus
Cubic AlGaN/GaN hetero-field effect transistors with normally on and normally off operation. - In: III-Nitride materials for sensing, energy conversion and controlled light-matter interactions, ISBN 978-1-605-11175-9, (2010), S. 107-112
Cubic AlGaN/GaN hetero-field effect transistors with normally on and normally off operation. - In: III-Nitride materials for sensing, energy conversion and controlled light-matter interactions, ISBN 978-1-605-11175-9, (2010), S. 107-112
Pezoldt, Jörg;
FTIR ellipsometry of SiC heterostructures. - In: AIP conference proceedings, ISSN 1551-7616, Bd. 1292 (2010), S. 83-86
http://dx.doi.org/10.1063/1.3518318
FTIR ellipsometry of SiC heterostructures. - In: AIP conference proceedings, ISSN 1551-7616, Bd. 1292 (2010), S. 83-86
http://dx.doi.org/10.1063/1.3518318
Leopold, Steffen; Polster, Tobias; Geiling, Thomas; Pätz, Daniel; Knöbber, Fabian; Albrecht, Arne; Ambacher, Oliver; Sinzinger, Stefan; Hoffmann, Martin
Structuring techniques of aluminiuim nitride masks for deep reactive ion etching (drie) of silicon. - In: Abstracts, ISBN 978-90-816737-1-6, (2010), S. 76-79
http://eprints.eemcs.utwente.nl/19346/
Structuring techniques of aluminiuim nitride masks for deep reactive ion etching (drie) of silicon. - In: Abstracts, ISBN 978-90-816737-1-6, (2010), S. 76-79
http://eprints.eemcs.utwente.nl/19346/
Bund, Andreas; Ispas, Adriana
Ionic liquids as novel reactive media for electrodeposition. - In: Symposium Galvanik - eine etablierte Technik innovativ angewendet, (2010), S. 39-44
Ionic liquids as novel reactive media for electrodeposition. - In: Symposium Galvanik - eine etablierte Technik innovativ angewendet, (2010), S. 39-44
Electrodeposition of thin Ta layers with thicknesses from some nm up to 1 m has been investigated in the ionic liquids 1-butyl- 1-methylpyrrolidinium bis(trifluoromethylsulfonyl)amide, ([Py1,4]-TFSA) and 1-ethyl-3-methylimidazolium bis(trifluoromethylsulfonyl) amide, ([EMIM] TFSA). It could be shown that Ta electrodeposition occurs in several steps and that not all the time the deposited species are elemental Ta. By increasing the temperature the quality of the deposited layers can be improved significantly. Moreover, the deposition potential influences strongly the morphology and structure of the deposits.
Cimalla, Volker; Röhlig, Claus-Christian; Lebedev, Vadim; Ambacher, Oliver; Tonisch, Katja; Niebelschütz, Florentina; Brückner, Klemens; Hein, Matthias
AlGaN/GaN based heterostructures for MEMS and NEMS applications. - In: Solid state phenomena, ISSN 1662-9779, Bd. 159 (2010), S. 27-38
http://dx.doi.org/10.4028/www.scientific.net/SSP.159.27
AlGaN/GaN based heterostructures for MEMS and NEMS applications. - In: Solid state phenomena, ISSN 1662-9779, Bd. 159 (2010), S. 27-38
http://dx.doi.org/10.4028/www.scientific.net/SSP.159.27
Niebelschütz, Florentina; Brückner, Klemens; Tonisch, Katja; Stephan, Ralf; Cimalla, Volker; Ambacher, Oliver; Hein, Matthias A.
Piezoelectric actuated epitaxially grown AlGaN/GaN-resonators. - In: Physica status solidi. Current topics in solid state physics. - Berlin : Wiley-VCH, 2002-2017 , ISSN: 1610-1642 , ZDB-ID: 2102966-0, ISSN 1610-1642, Bd. 7 (2010), 7/8, S. 1829-1831
http://dx.doi.org/10.1002/pssc.200983616
Piezoelectric actuated epitaxially grown AlGaN/GaN-resonators. - In: Physica status solidi. Current topics in solid state physics. - Berlin : Wiley-VCH, 2002-2017 , ISSN: 1610-1642 , ZDB-ID: 2102966-0, ISSN 1610-1642, Bd. 7 (2010), 7/8, S. 1829-1831
http://dx.doi.org/10.1002/pssc.200983616
Grosser, Michaela; Münch, M.; Brenner, J.; Wilke, Marcus; Seidel, H.; Bienert, C.; Roosen, A.; Schmid, U.
Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering. - In: Microsystem technologies, ISSN 1432-1858, Bd. 16 (2010), 5, S. 825-836
http://dx.doi.org/10.1007/s00542-009-0993-0
Study on microstructural, chemical and electrical properties of tantalum nitride thin films deposited by reactive direct current magnetron sputtering. - In: Microsystem technologies, ISSN 1432-1858, Bd. 16 (2010), 5, S. 825-836
http://dx.doi.org/10.1007/s00542-009-0993-0
Werner, Michael; Halbedel, Bernd; Rädlein, Edda
Numerical study of magnet systems for Lorentz force velocimetry in electrically low conducting fluids. - In: Proceedings of the 6th International Scientific Colloquium Modelling for Material Processing, ISBN 978-9984-45-223-4, (2010), S. 233-238
Numerical study of magnet systems for Lorentz force velocimetry in electrically low conducting fluids. - In: Proceedings of the 6th International Scientific Colloquium Modelling for Material Processing, ISBN 978-9984-45-223-4, (2010), S. 233-238
Lüdtke, Ulrich; Kelm, André; Halbedel, Bernd; Krieger, Uwe
Numerical simulation of Lorentz force enhanced flow patterns within glass melts. - In: Proceedings of the 6th International Scientific Colloquium Modelling for Material Processing, ISBN 978-9984-45-223-4, (2010), S. 227-232
Numerical simulation of Lorentz force enhanced flow patterns within glass melts. - In: Proceedings of the 6th International Scientific Colloquium Modelling for Material Processing, ISBN 978-9984-45-223-4, (2010), S. 227-232