Structure of cubic polytype indium nitride layers on top of modified sapphire substrates. - In: Physica status solidi, ISSN 1610-1642, Bd. 5 (2008), 2, S. 514-517
The occurrence of cubic indium nitride thin layers grown by molecular beam epitaxy on top of c-plane sapphire substrates modified by an intermediate layer of cubic indium oxide is reported. An orientation relationship between the (0001) plane of Al2O3 and both (001) surfaces of body-centered cubic In2O3 and zinc-blende InN is demonstrated by means of electron and X-ray diffraction and by transmission electron microscopy. We propose that the demonstrated approach is able to stabilize the non equilibrium phase of InN (i. e., the cubic polytype) due to a low lattice mismatch together with a four fold surface atomic arrangement of the indium oxide-indium nitride interface.
https://doi.org/10.1002/pssc.200777472
Bioreactor with integrated nanosensor for the recording of extracellular potential of nerve cells: response to inhibitors record with AlGaN/GaN field - effect transistor. - In: Life sciences, medicine, and bio materials, ISBN 978-1-420-08504-4, (2008), S. 566-568
Growth and characterization of indium oxide films for ozone detection. - In: Prospects in mechanical engineering, (2008), insges. 11 S.
http://www.db-thueringen.de/servlets/DocumentServlet?id=18741
Multimode frequency response of piezoelectric AlGaN/GaN micro-electromechanical RF resonators. - In: Technical digest, (2008), S. 165-168
Study of microstructure and strain relaxation on thin InXGa1-xN epilayers with medium and high In contents. - In: Materials science, ISBN 978-3-540-85225-4, (2008), S. 77-78
Polarization induced effects in GaN-based heterostructures and novel sensors. - In: Polarization effects in semiconductors, (2008), S. 27-109
Lattice location determination of Ge in SiC by ALCHEMI. - In: Microscopy of semiconducting materials 2007, (2008), S. 353-358
Isotropic dry-etching of SiC for AlGaN/GaN MEMS fabrication. - In: Conference on Optoelectronic and Microelectronic Materials and Devices, 2008, ISBN 978-1-4244-2716-1, (2008), S. 26-29
http://dx.doi.org/10.1109/COMMAD.2008.4802084
Hydrogenated amorphous carbon films prepared by plasma-enhanced chemical vapor deposition. - In: International Conference on Advanced Semiconductor Devices and Microsystems, 2008, ISBN 978-1-4244-2326-2, (2008), S. 127-130
http://dx.doi.org/10.1109/ASDAM.2008.4743297
PECVD silicon carbon nitrid thin films: properties. - In: International Conference on Advanced Semiconductor Devices and Microsystems, 2008, ISBN 978-1-4244-2326-2, (2008), S. 291-294
http://dx.doi.org/10.1109/ASDAM.2008.4743340