Characterisation of the metrological properties of 3-D microprobes. - In: Laser metrology and machine performance IX, ISBN 978-0-9553082-7-7, (2009), S. 243-252
Monte Carlo simulation to determine the measurement uncertainty of a metrological scanning probe microscope measurement. - In: Scanning microscopy 2009, ISBN 978-0-8194-7654-8, 2009, 737816, insges. 12 S.
A proprietary metrological scanning probe microscope (SPM) with an interferometer, developed by the Institute of Process Measurement and Sensor Technology at the Ilmenau University of Technology (IPMS), is used as a stationary probe system in the nanomeasuring and nanopositioning machine (NPMM). Due to the movements of the NPMM, the total microscope measuring range is 25mm × 25mm × 5mm with a positioning resolution of less than 0.1nm. Examples for specimens are step height standards and one-dimensional gratings. The repeatability has been determined at less than 0.5nm for measurements on calibrated step height standards and less than 0.2nm for the gratings. The measurement results of these samples are always directly related to the corresponding measurement uncertainty, which can be calculated using an uncertainty budget. A new traceable method has been developed using a vectorial modular model. With this approach, it is possible to quickly insert new sub-models and to individually analyze their effects on the total measurement uncertainty. The analysis of these effects with regard to their uncertainties is done by Monte Carlo Simulation (MCS), because some models have partially or fully nonlinear character of which one example is the interferometer model of the metrological SPM. The complete development and analysis of these models is presented for one specific measurement task. The measurement results and the corresponding measurement uncertainty were obtained by Monte Carlo Simulation. Comparisons with the GUM have shown that the proposed procedure is a good alternative to achieve reasonable measurement results with uncertainty estimation.
Design and performance of the new Sartorius 1kg-prototype mass comparator for high precision mass determination and research applications. - In: Transverse disciplines in metrology, ISBN 978-1-8482-1048-6, (2009), S. 657-667
Mass dissemination using a robot system. - In: Technisches Messen, ISSN 2196-7113, Bd. 76 (2009), 7/8, S. 382-387
http://dx.doi.org/10.1524/teme.2009.0976
Optical system for the simultaneous measurement of two-dimensional straightness errors and the roll angle. - In: Optical sensors 2009, ISBN 978-0-8194-7630-2, 2009, 73560S, insges. 8 S.
Advanced three-dimensional scan methods in the nanopositioning and nanomeasuring machine. - In: Measurement science and technology, ISSN 1361-6501, Bd. 20 (2009), 8, S. 084004, insges. 8 S.
The nanopositioning and nanomeasuring machine developed at the Ilmenau University of Technology was originally designed for surface measurements within a measuring volume of 25 mm × 25 mm × 5 mm. The interferometric length measuring and drive systems make it possible to move the stage with a resolution of 0.1 nm and a positioning uncertainty of less than 10 nm in all three axes. Various measuring tasks are possible depending on the installed probe system. Most of the sensors utilized are one-dimensional surface probes; however, some tasks require measuring sidewalls and other three-dimensional features. A new control system, based on the I++ DME specification, was implemented in the device. The I++ DME scan functions were improved and special scan functions added to allow advanced three-dimensional scan methods, further fulfilling the demands of scanning force microscopy and micro-coordinate measurements. This work gives an overview of these new functions and the application of them for several different measurements.
http://dx.doi.org/10.1088/0957-0233/20/8/084004
Navigation in a large measurement volume by using AFM technology as a sensor system in the NPMM. - In: Technisches Messen, ISSN 2196-7113, Bd. 76 (2009), 5, S. 274-277
http://dx.doi.org/10.1524/teme.2009.0968
The application of the dual-beam laser interferometer for calibration precision machine tools. - In: Technisches Messen, ISSN 2196-7113, Bd. 76 (2009), 5, S. 245-247
http://dx.doi.org/10.1524/teme.2009.0963
Uncertainty consideration of the coordinate system in nanopositioning- and nanomeasuring machines. - In: Technisches Messen, ISSN 2196-7113, Bd. 76 (2009), 5, S. 235-238
http://dx.doi.org/10.1524/teme.2009.0961
The metrological basis and operation of nanopositioning and nanomeasuring machine NMM-1. - In: Technisches Messen, ISSN 2196-7113, Bd. 76 (2009), 5, S. 227-234
http://dx.doi.org/10.1524/teme.2009.0960